Title:
AROMATIC SULFONIUM SALT COMPOUND, PHOTOACID GENERATOR, RESIST COMPOSITION, CATIONIC POLYMERIZATION INITIATOR, AND CATIONICALLY POLYMERIZABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2016/147356
Kind Code:
A1
Abstract:
Provided are: an aromatic sulfonium salt compound that exhibits low corrosion with respect to a substrate, that has excellent photolithographic characteristics, and that is useful in a photoacid generator and a cationic polymerization agent; and a photoacid generator, a resist composition, a cationic polymerization initiator, and a cationically polymerizable composition that use the aromatic sulfonium salt compound. The aromatic sulfonium salt compound is represented by general formula (I) (in formula (I), R1 to R10 each independently represent an alkyl group or the like that has 1 to 18 carbon atoms and that may comprise a hydrogen atom, a halogen atom, a hydroxyl group, a nitro group, a cyano group, or a substituent group, R11 to R15 each independently represent an alkoxy group or the like that has 1 to 18 carbon atoms and that may comprise a hydrogen atom or a substituent group, one or more of R11 to R15 is not a hydrogen atom, and X1
- represents a monovalent organic sulfonic acid anion).
Inventors:
YANAGISAWA SATOSHI (JP)
TODA HITOMI (JP)
SHIGENO KOICHI (JP)
KIMURA MASAKI (JP)
TODA HITOMI (JP)
SHIGENO KOICHI (JP)
KIMURA MASAKI (JP)
Application Number:
PCT/JP2015/058119
Publication Date:
September 22, 2016
Filing Date:
March 18, 2015
Export Citation:
Assignee:
ADEKA CORP (JP)
International Classes:
C07D311/16; C08G59/68; G03F7/004
Domestic Patent References:
| WO2011052327A1 | 2011-05-05 |
Foreign References:
| JP2014094925A | 2014-05-22 | |||
| JP2011105645A | 2011-06-02 | |||
| JP2013104985A | 2013-05-30 | |||
| JP2015004961A | 2015-01-08 |
Other References:
See also references of EP 3272744A4
Attorney, Agent or Firm:
HONDA ICHIRO (JP)
Ichiro Honda (JP)
Ichiro Honda (JP)
Download PDF: