Title:
BLOCK COPOLYMER FOR PHOTOSENSITIVE PRINTING PLATE MATERIAL HAVING EXCELLENT ABRASION RESISTANCE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2019/044369
Kind Code:
A1
Abstract:
Provided is a flexographic printing plate having improved abrasion resistance in addition to the moderate elasticity (softness) required for a flexographic printing plate. The present invention is a block copolymer for a photosensitive printing plate material that is a block copolymer comprising a polymer block composed mainly of at least two aromatic vinyl monomers and a polymer block composed mainly of at least one conjugated diene monomer, wherein the aromatic vinyl monomer introduced into the polymer block composed mainly of a conjugated diene block is 25-50 mass% of the total bonded aromatic vinyl monomer content in the block copolymer.
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Inventors:
TORII MASATOSHI (JP)
YAMAMOTO SHINGO (JP)
FUJISAKI HIKARU (JP)
YAMAMOTO SHINGO (JP)
FUJISAKI HIKARU (JP)
Application Number:
PCT/JP2018/029078
Publication Date:
March 07, 2019
Filing Date:
August 02, 2018
Export Citation:
Assignee:
KRATON JSR ELASTOMERS K K (JP)
International Classes:
C08F297/04; B41N1/12
Domestic Patent References:
| WO2015108150A1 | 2015-07-23 | |||
| WO2015170739A1 | 2015-11-12 | |||
| WO2017126469A1 | 2017-07-27 |
Foreign References:
| JP2012036309A | 2012-02-23 | |||
| JP2002540268A | 2002-11-26 | |||
| JP2005509066A | 2005-04-07 | |||
| JP2005126485A | 2005-05-19 | |||
| JP2006104359A | 2006-04-20 | |||
| JP2007511805A | 2007-05-10 | |||
| JP2016210647A | 2016-12-15 | |||
| JP2016210877A | 2016-12-15 | |||
| JP2006104359A | 2006-04-20 |
Other References:
YASUYUKI TANAKA ET AL., MACROMOLECULES, vol. 16, no. 12, 1983, pages 1925 - 1928
See also references of EP 3677608A4
See also references of EP 3677608A4
Attorney, Agent or Firm:
KAWAGUTI & PARTNERS (JP)
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