Title:
CARRIER HEAD WITH CONTROLLABLE EDGE PRESSURE
Document Type and Number:
WIPO Patent Application WO2001072473
Kind Code:
A3
Abstract:
A carrier head (100) for a chemical mechanical polishing apparatus includes a flexible membrane (150) that applies a load to a substrate. The substrate backing assembly (112) includes an internal membrane (150), an external membrane (152), an internal membrane support structure (160), an upper membrane spacer ring (162), a lower membrane spacer ring (164), and an edge control ring (166). The edge control ring (166) is a generally annular member positioned between the retaining ring (110) and the external membrane (152). The edge control ring (166) includes a cylindrical portion (210) and a flange portion (212) which extends outwardly toward inner surface (118) of retaining ring (110) to maintain the lateral position of the external spacer ring. An overhang (214) formed in the cylindrical portion (210) can fit over the thick portion (186) so that the edge control ring (166) tests on the external membrane (152).
Inventors:
ZUNIGA STEVEN M
PRABHU GOPALAKRISHNA B
MEAR STEVEN T
PRABHU GOPALAKRISHNA B
MEAR STEVEN T
Application Number:
PCT/US2001/008070
Publication Date:
January 31, 2002
Filing Date:
March 13, 2001
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
International Classes:
B24B37/30; H01L21/304; (IPC1-7): B24B37/04; B24B41/06
Domestic Patent References:
| WO1999007516A1 | 1999-02-18 | |||
| WO1999059776A1 | 1999-11-25 | |||
| WO1999033613A1 | 1999-07-08 |
Foreign References:
| EP1029633A1 | 2000-08-23 | |||
| FR2778129A1 | 1999-11-05 |
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