CHARGED PARTICLE BEAM DRAWING DEVICE AND METHOD FOR DRAWING CHARGED PARTICLE BEAM

WIPO Patent Application WO/2020/026696

A1

The present invention performs drift correction with high precision while suppressing the calculation amount. This charged particle beam drawing device according to a mode of the present invention comprises: an emitting unit that emits charged particle beams; a deflector that adjusts the irradiation position of the charged particle beams with respect to a substrate placed on a stage; a shot data generating unit that generates shot data from drawing data, including shot size, shot position, and beam on/off time for each shot; a drift correction unit that references the plurality of shot data for each prescribed region irradiated by the charged particle beams, or each prescribed shot count of the irradiated charged particle beam, calculates the drift amount of the irradiation position of the charged particle beam irradiated on the substrate based on the shot size, the shot position, and the beam on/off time, and generates correction information for correcting irradiation position skew based on the drift amount; and a deflection control unit that controls the deflection amount by the deflector based on the shot data and the correction information.

YAMADA TAKU (JP)

PCT/JP2019/026676

February 06, 2020

July 04, 2019

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NUFLARE TECHNOLOGY INC (JP)

H01L21/027; G03F7/20; H01J37/147; H01J37/305

JP2012015246A	2012-01-19
JP2010073909A	2010-04-02
JP2001006992A	2001-01-12
JPH10256112A	1998-09-25
JPH09293671A	1997-11-11

SHIGENO, Tsuyoshi et al. (JP)

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