Title:
CHARGED PARTICLE BEAM DRAWING METHOD AND CHARGED PARTICLE BEAM DRAWING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/229966
Kind Code:
A1
Abstract:
The purpose of the present invention is to precisely correct misalignment caused by a charging phenomenon. A charged particle beam drawing method according to the present invention comprises: a step for virtually dividing a drawing region of a substrate into a prescribed mesh size and calculating a pattern density distribution indicating a placement ratio of a pattern in each mesh region; a step for calculating a dosage distribution by using the pattern density distribution; a step for calculating an exposure distribution by using the pattern density distribution and the dosage distribution; a step for calculating a fogging charged particle amount distribution; a step for calculating a charge amount distribution due to direct charging and a charge amount distribution due to fog charging; a step for calculating a misalignment amount of a drawing position on the basis of the charge amount distribution due to direct charging and the charge amount distribution due to fog charging; a step for using the misalignment amount to correct an irradiation position; and a step for irradiating the corrected irradiation position with a charged particle beam such that the potential on the top surface of the substrate is greater than the potential on the bottom surface of a potential regulating member.
Inventors:
NOMURA HARUYUKI (JP)
NAKAYAMA TAKAHITO (JP)
NAKAYAMA TAKAHITO (JP)
Application Number:
PCT/JP2021/015025
Publication Date:
November 18, 2021
Filing Date:
April 09, 2021
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/09; G03F7/20; H01J37/20; H01J37/305; H01L21/027
Foreign References:
| JP2018133552A | 2018-08-23 | |||
| JP2014038945A | 2014-02-27 | |||
| JP2015179735A | 2015-10-08 | |||
| JPH06232032A | 1994-08-19 |
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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