Title:
PROCESSING METHOD FOR GLASS SUBSTRATES AND PRODUCTION METHOD FOR EUVL MASK BLANKS
Document Type and Number:
WIPO Patent Application WO/2021/229967
Kind Code:
A1
Abstract:
This processing method for glass substrates comprises: preparing a protective layer-equipped glass substrate that has a glass substrate and a protective layer containing a resin layer which is in contact with the glass substrate; holding the protective layer-equipped glass substrate by means of a clamp placed against the protective layer; and, while the protective layer-equipped glass substrate is held by the clamp, etching a first main surface of the glass substrate by irradiating the first main surface with a gas cluster in the form of a beam.
Inventors:
NARA TAKUMA (JP)
TAMURA MASAHIKO (JP)
YAMANA SATOSHI (JP)
TAMURA MASAHIKO (JP)
YAMANA SATOSHI (JP)
Application Number:
PCT/JP2021/015047
Publication Date:
November 18, 2021
Filing Date:
April 09, 2021
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
C03C15/00; C03C17/32; C03C17/36; G03F1/24; G03F1/60; G03F7/20
Domestic Patent References:
| WO2011115131A1 | 2011-09-22 | |||
| WO2008065973A1 | 2008-06-05 |
Foreign References:
| JP2016509263A | 2016-03-24 | |||
| JP2009155170A | 2009-07-16 | |||
| JP2010189228A | 2010-09-02 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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