Title:
CHARGED PARTICLE BEAM SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/195536
Kind Code:
A1
Abstract:
The present disclosure proposes a charged particle beam system that achieves both throughput improvement and accurate measurement in semiconductor pattern measurement processing. The charged particle beam system comprises: a charged particle beam device including a charged particle source that emits a charged particle beam, a stage on which a sample is placed, a first deflector configured to deflect the charged particle beam, a second deflector configured to deflect signal particles emitted from the sample, a detector configured to detect the signal particles, and a position detection device configured to detect the position of the sample or the stage; and a computer system that controls the operation of the charged particle beam device. Further, the computer system performs output control of the second deflector on the basis of position information detected by the position detection device (see FIG. 1).
Inventors:
SUZUKI KOHEI (JP)
MIZUTANI SHUNSUKE (JP)
MIZUHARA YUZURU (JP)
MIZUTANI SHUNSUKE (JP)
MIZUHARA YUZURU (JP)
Application Number:
PCT/JP2023/014391
Publication Date:
October 12, 2023
Filing Date:
April 07, 2023
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/147; H01J37/244; H01J37/28; H01L21/66
Foreign References:
| JP2006351554A | 2006-12-28 | |||
| JP2014093153A | 2014-05-19 | |||
| JP2021168286A | 2021-10-21 | |||
| JP2018088321A | 2018-06-07 | |||
| JP2015216075A | 2015-12-03 |
Attorney, Agent or Firm:
HIRAKI & ASSOCIATES (JP)
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