Title:
CHEMICAL CLEANING FLUID CONFIGURATION SYSTEM AND METHOD
Document Type and Number:
WIPO Patent Application WO/2023/284032
Kind Code:
A1
Abstract:
Provided are a chemical cleaning fluid configuration system (100) and method. The chemical cleaning fluid configuration system (100) is disposed in a chemical mechanical polishing apparatus (1000), and comprises: a first mixing system (1) configured to mix a first chemical solution and a first dilution solution to obtain a first mixed solution; a second mixing system (2) configured to mix a second chemical solution and a second dilution solution to obtain a second mixed solution; a third mixing system (3) configured to mix the first mixed solution, the second mixed solution, and a third dilution solution to obtain a third mixed solution; an output system (4) configured to output the third mixed solution to a spray device (901) of the chemical mechanical polishing apparatus (1000); a sampling system (5) configured to sample the third mixed solution output by the output system (4), wherein the sampling system (5) is a branch system communicated with the output system (4); and a monitoring system (6) configured to monitor the states of the first mixed solution, the second mixed solution, and the third mixed solution.
Inventors:
TSENG PO-CHANG (CN)
TSAI CHANG-YI (CN)
TSAI CHANG-YI (CN)
Application Number:
PCT/CN2021/110041
Publication Date:
January 19, 2023
Filing Date:
August 02, 2021
Export Citation:
Assignee:
CHANGXIN MEMORY TECH INC (CN)
International Classes:
G01N27/06; B08B3/00; G01F1/00; G01L11/00
Foreign References:
| US20130067998A1 | 2013-03-21 | |||
| CN204841441U | 2015-12-09 | |||
| CN112881543A | 2021-06-01 | |||
| US20030174306A1 | 2003-09-18 | |||
| US4678119A | 1987-07-07 | |||
| CN204147826U | 2015-02-11 | |||
| CN209417007U | 2019-09-20 | |||
| CN103090190A | 2013-05-08 |
Attorney, Agent or Firm:
BOXIN CHINA INTELLECTUAL PROPERTY (CN)
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