Title:
CHEMICAL LIQUID FOR FORMING WATER REPELLENT PROTECTIVE FILM
Document Type and Number:
WIPO Patent Application WO/2018/150775
Kind Code:
A1
Abstract:
This chemical liquid for forming a water repellent protective film contains (I) at least one first solvent which is selected from the group consisting of ether solvents and hydrocarbon solvents, (II) a second solvent which is composed of a glycol ether, (III) a silylating agent represented by general formula [1], and (IV) a base represented by general formula [2] and/or general formula [3]. This chemical liquid for forming a water repellent protective film is configured such that: the concentration of the component (II) relative to the total amount of the chemical liquid is 1-30% by mass; the concentration of the component (III) relative to the total amount of the chemical liquid is 2-15% by mass; the concentration of the component (IV) relative to the total amount of the chemical liquid is 0.05-2% by mass; and the mass ratio (III)/(IV) is 4.5 or more.
(R1)a(H)bSi(OCOR2)4-a-b [1]
(R3)c(H)dSi(X)4-c-d [2]
[(R4)e(H)fSi]2NH [3]
If this chemical liquid is used as a member to be in contact with a liquid in a cleaning device for wafers that contain a vinyl chloride resin, this chemical liquid is capable of exerting suppression of swelling of the vinyl chloride resin, suppression of discoloration of the vinyl chloride resin and suppression of precipitation of solids in the chemical liquid in a balanced manner.
Inventors:
OKUMURA YUZO (JP)
FUKUI YUKI (JP)
FUKAZAWA HIROKI (JP)
KUMON SOICHI (JP)
FUKUI YUKI (JP)
FUKAZAWA HIROKI (JP)
KUMON SOICHI (JP)
Application Number:
PCT/JP2018/000745
Publication Date:
August 23, 2018
Filing Date:
January 15, 2018
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
H01L21/304; C09D7/40; C09D183/08
Domestic Patent References:
| WO2011155407A1 | 2011-12-15 |
Foreign References:
| JP2012015335A | 2012-01-19 |
Attorney, Agent or Firm:
KOBAYASHI, Hiromichi et al. (JP)
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