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Title:
CHEMICAL LIQUID
Document Type and Number:
WIPO Patent Application WO/2023/189371
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a chemical liquid that, when used in a step for bringing a contact target object into contact with the chemical liquid, is less likely to generate a predetermined defect in the contact target object. The chemical liquid according to the present invention contains an organic solvent, and metal-containing particles containing a metal element selected from the group consisting of Fe, Ni, and Zn, and has an I value of 0.010-10.000 as determined by method X. Method X: An I value, in a unit of count/mm2, is determined by: preparing a specimen by applying the chemical liquid to a substrate; scanning and analyzing the surface of the specimen with laser by using laser abrasion-inductively coupled plasma-mass spectrometry; acquiring, for each metal element, a chart in which the horizontal axis represents the scanning time of the laser and the vertical axis represents ion detection intensity; integrating the ion detection intensity in the chart over the scanning time to determine an integrated ion detection intensity for each of the metal elements; obtaining a total integrated ion detection intensity by adding up the integrated ion detection intensities of the respective metal elements; and dividing the total integrated ion detection intensity by the scanning area of the laser.

Inventors:
OHTSU AKIHIKO (JP)
YOSHIDOME MASAHIRO (JP)
KAMIMURA TETSUYA (JP)
SAITO RYO (JP)
Application Number:
PCT/JP2023/009118
Publication Date:
October 05, 2023
Filing Date:
March 09, 2023
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/32; G03F7/16; G03F7/38; G03F7/42; H01L21/304
Domestic Patent References:
WO2020179428A12020-09-10
WO2020071042A12020-04-09
WO2020040042A12020-02-27
Foreign References:
US20030166482A12003-09-04
JP2023038168A2023-03-16
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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