Title:
CHEMICAL-RESISTANT PROTECTIVE FILM
Document Type and Number:
WIPO Patent Application WO/2023/228661
Kind Code:
A1
Abstract:
The present invention provides a composition for forming a protective film against a wet etching liquid for semiconductor, the composition containing: (A) a compound or a polymer having a reactive group capable of undergoing a crosslinking reaction in the presence of a curing agent; (B) a curing agent; (C) a β-dicarbonyl compound; and (D) a solvent.
Inventors:
NISHITA TOKIO (JP)
KINOSHITA KAZUHIKO (JP)
KINOSHITA KAZUHIKO (JP)
Application Number:
PCT/JP2023/016195
Publication Date:
November 30, 2023
Filing Date:
April 25, 2023
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
G03F7/11; C08G59/40; G03F7/26; H01L21/027
Domestic Patent References:
| WO2013012068A1 | 2013-01-24 | |||
| WO2022054853A1 | 2022-03-17 |
Foreign References:
| JP6035418B2 | 2016-11-30 | |||
| JP6096202B2 | 2017-03-15 | |||
| JP3918942B2 | 2007-05-23 | |||
| JP6995865B2 | 2022-01-17 |
Attorney, Agent or Firm:
TAKAOKA Ryoichi et al. (JP)
Download PDF: