Title:
CHEMICAL SOLUTION ACCOMMODATION BODY
Document Type and Number:
WIPO Patent Application WO/2020/040034
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a chemical solution accommodation body which accommodates a chemical solution having excellent defect suppression performance. This chemical solution accommodation body has: a container; and a chemical solution accommodated in the container. The chemical solution contains: a solvent; metal-containing particles including metal atoms; and an organic compound having a ClogP value higher than that of the solvent, wherein the content of the metal-containing particles is 10 mass-ppt or less with respect to the total mass of the chemical solution, a gas, which contains the organic compound having the ClogP value higher than that of the solvent, is present in the vacant space of the container, and the total content of the organic compound in the gas and the organic compound in the chemical solution is 100,000 mass-ppt or less with respect to the total mass of the chemical solution.
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Inventors:
SHIMIZU TETSUYA (JP)
KAMIMURA TETSUYA (JP)
OOMATSU TADASHI (JP)
TAKAHASHI SATOMI (JP)
KAMIMURA TETSUYA (JP)
OOMATSU TADASHI (JP)
TAKAHASHI SATOMI (JP)
Application Number:
PCT/JP2019/032036
Publication Date:
February 27, 2020
Filing Date:
August 15, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/16; B65D23/02; B65D85/84; G03F7/038; G03F7/039; G03F7/11; G03F7/32; H01L21/304
Domestic Patent References:
| WO2018092763A1 | 2018-05-24 | |||
| WO2016052393A1 | 2016-04-07 |
Foreign References:
| JP2018081307A | 2018-05-24 | |||
| US20040206702A1 | 2004-10-21 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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