Title:
CLEANING AGENT COMPOSITION AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2021/201047
Kind Code:
A1
Abstract:
A cleaning agent composition which is used for the purpose of removing an adhesive residue. This cleaning agent composition is characterized by containing a quaternary ammonium salt, a metal corrosion inhibitor and an organic solvent, and is also characterized in that the metal corrosion inhibitor is composed of an aliphatic saturated hydrocarbon compound monocarboxylic acid having from 7 to 40 carbon atoms, an aliphatic saturated hydrocarbon compound dicarboxylic acid having from 7 to 40 carbon atoms or an acid anhydride thereof, an aliphatic unsaturated hydrocarbon compound monocarboxylic acid having from 7 to 40 carbon atoms, or an aliphatic unsaturated hydrocarbon compound dicarboxylic acid having from 7 to 40 carbon atoms or an acid anhydride thereof.
Inventors:
OGINO HIROSHI (JP)
OKUNO TAKAHISA (JP)
YANAI MASAKI (JP)
MORIYA SHUNSUKE (JP)
OGATA HIROTO (JP)
FUKUDA TAKUYA (JP)
SHINJO TETSUYA (JP)
OKUNO TAKAHISA (JP)
YANAI MASAKI (JP)
MORIYA SHUNSUKE (JP)
OGATA HIROTO (JP)
FUKUDA TAKUYA (JP)
SHINJO TETSUYA (JP)
Application Number:
PCT/JP2021/013710
Publication Date:
October 07, 2021
Filing Date:
March 30, 2021
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C11D1/62; C11D3/20; C11D3/43; H01L21/304
Domestic Patent References:
| WO2020179819A1 | 2020-09-10 | |||
| WO2020184618A1 | 2020-09-17 | |||
| WO2014092022A1 | 2014-06-19 |
Foreign References:
| JP2001316691A | 2001-11-16 | |||
| JP2019516130A | 2019-06-13 | |||
| JP2007254555A | 2007-10-04 | |||
| JP2009197175A | 2009-09-03 | |||
| JP2004501765A | 2004-01-22 | |||
| JP2017199754A | 2017-11-02 | |||
| JP2019532489A | 2019-11-07 | |||
| US6818608B2 | 2004-11-16 | |||
| KR20180066550A | 2018-06-19 |
Other References:
See also references of EP 4130217A4
Attorney, Agent or Firm:
KURIHARA, Hiroyuki et al. (JP)
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