Title:
CLEANING DEVICE AND CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/081817
Kind Code:
A1
Abstract:
A cleaning device 100 is characterized by having a supporting table 11, a liquid supply line 21, a discharge nozzle 23, a suction nozzle 33, a vacuum line 31, a discharge nozzle moving mechanism 72 for moving the discharge nozzle 23, and a suction nozzle moving mechanism 73 for moving the suction nozzle 33. The cleaning device is also characterized in that: during a time when cleaning is performed, a discharge port 231 of the discharge nozzle 23 is positioned by means of the discharge nozzle moving mechanism 72 to a region inside of a suction region where a liquid is sucked from a surface of a semiconductor substrate 31 by means of the suction nozzle 33; and the suction nozzle 33 sucks the liquid in a state wherein the suction nozzle is being separated from the surface of the semiconductor substrate 13.
Inventors:
WATANABE KEIJI (JP)
KAWAMURA TETSUFUMI (JP)
MINE TOSHIYUKI (JP)
SUGII NOBUYUKI (JP)
RYUZAKI DAISUKE (JP)
KAWAMURA TETSUFUMI (JP)
MINE TOSHIYUKI (JP)
SUGII NOBUYUKI (JP)
RYUZAKI DAISUKE (JP)
Application Number:
PCT/JP2015/081994
Publication Date:
May 18, 2017
Filing Date:
November 13, 2015
Export Citation:
Assignee:
HITACHI LTD (JP)
International Classes:
H01L21/304
Domestic Patent References:
| WO2006038472A1 | 2006-04-13 |
Foreign References:
| JP2010514215A | 2010-04-30 | |||
| JP2008124203A | 2008-05-29 | |||
| JP2015115491A | 2015-06-22 | |||
| JP2006229020A | 2006-08-31 |
Attorney, Agent or Firm:
SEIRYO I.P.C. (JP)
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