Title:
FLUID PROCESSING DEVICE AND FLUID PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/081818
Kind Code:
A1
Abstract:
The present invention pertains to a fluid processing device and a fluid processing method. A first fluid processing device (10A) has a first electrode (14a) and a second electrode (14b) provided in a fluid (12), and a pulse power source (16) for applying a pulse voltage between the first electrode (14a) and the second electrode (14b). The rising transition (dV/dt) of the pulse voltage is 50−500 kV/μsec, the duty ratio (Tw/Ｔ) of the pulse voltage is 5×10−5 to 5×10−3, and the peak value (Vp) of the pulse voltage is 5−30 kV.
Inventors:
HOTTA EIKI (JP)
WATANABE MASATO (JP)
SHIMIZU HIDEKI (JP)
SHIMIZU NAOHIRO (JP)
TANGE SHOJI (JP)
YAMADA KAZUNARI (JP)
YOKOYAMA TAKASHI (JP)
WATANABE MASATO (JP)
SHIMIZU HIDEKI (JP)
SHIMIZU NAOHIRO (JP)
TANGE SHOJI (JP)
YAMADA KAZUNARI (JP)
YOKOYAMA TAKASHI (JP)
Application Number:
PCT/JP2015/082004
Publication Date:
May 18, 2017
Filing Date:
November 13, 2015
Export Citation:
Assignee:
TOKYO INST TECH (JP)
NGK INSULATORS LTD (JP)
NGK INSULATORS LTD (JP)
International Classes:
C02F1/48
Domestic Patent References:
| WO2011065171A1 | 2011-06-03 |
Foreign References:
| JP2004225133A | 2004-08-12 | |||
| JP2010284635A | 2010-12-24 | |||
| JP2008302198A | 2008-12-18 | |||
| JP2012228644A | 2012-11-22 |
Attorney, Agent or Firm:
CHIBA Yoshihiro et al. (JP)
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