Title:
CLEANING DEVICE AND ROLL CLEANING MEMBER
Document Type and Number:
WIPO Patent Application WO/2016/002219
Kind Code:
A1
Abstract:
The purpose of the present invention is to prevent or reduce cleaning unevenness in cleaning a substrate using a roll cleaning member having protruding members. A roll cleaning device is provided with a substrate support member for supporting and rotating a substrate (W), and an upper roll cleaning member (52) for scrub cleaning while rotating the surface of the substrate (W) rotated by the substrate support member. The upper roll cleaning member (52) is provided with a plurality of protruding members arranged in the longitudinal direction thereof and slidably contacting the surface of the substrate (W). The roll cleaning device cleans the substrate (W) such that the trajectories of high cleaning force regions out of the parts of the protruding members slidably in contact with the substrate (W) are present without a gap in the radial direction of the substrate (W).
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Inventors:
ISHIBASHI TOMOATSU (JP)
Application Number:
PCT/JP2015/003314
Publication Date:
January 07, 2016
Filing Date:
July 01, 2015
Export Citation:
Assignee:
EBARA CORP (JP)
International Classes:
H01L21/304
Foreign References:
| JP2000270929A | 2000-10-03 | |||
| JP2011233646A | 2011-11-17 | |||
| JP2008311481A | 2008-12-25 | |||
| JP2009066527A | 2009-04-02 | |||
| JP2006075718A | 2006-03-23 |
Attorney, Agent or Firm:
OHNO, Seiji et al. (JP)
Seiji Ono (JP)
Seiji Ono (JP)
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