Title:
CLEANING METHOD FOR MONOCRYSTAL PULLING DEVICE, CLEANING TOOL USED FOR SAME, AND PRODUCTION METHOD FOR MONOCRYSTAL
Document Type and Number:
WIPO Patent Application WO/2016/125605
Kind Code:
A1
Abstract:
[Problem] To provide a cleaning method for a monocrystal pulling device capable of removing foreign matter in a chamber to prevent occurrence of dislocation. [Solution] A cleaning method for a monocrystal pulling device according to the present invention involves: preparing a dummy crucible that simulates a crucible by including a dummy liquid surface simulating a liquid surface of a raw material melt in the crucible and a first dummy ingot simulating a monocrystal ingot that is being pulled upward from the liquid surface of the raw material melt; supplying an inert gas into a decompressed chamber of the monocrystal pulling device in a state where the dummy crucible is placed in the chamber; and generating a flow of the inert gas affected by the dummy crucible, thereby causing foreign matter attached to the wall surface of the chamber or to a component in the chamber to fall off.
Inventors:
OKITA KENJI (JP)
Application Number:
PCT/JP2016/051815
Publication Date:
August 11, 2016
Filing Date:
January 22, 2016
Export Citation:
Assignee:
SUMCO CORP (JP)
International Classes:
C30B15/00; C30B29/06
Foreign References:
| JP2012066948A | 2012-04-05 | |||
| JP2004123407A | 2004-04-22 | |||
| JP2002160994A | 2002-06-04 | |||
| JP2001354489A | 2001-12-25 |
Attorney, Agent or Firm:
WASHIZU Mitsuhiro et al. (JP)
Mitsuhiro Washizu (JP)
Mitsuhiro Washizu (JP)
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