Title:
COLOR FILM SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY PANEL
Document Type and Number:
WIPO Patent Application WO/2019/037388
Kind Code:
A1
Abstract:
A color film substrate (100) and a manufacturing method therefor. A quantum dot material is subjected to surface modification by means of a surface modifier, such that the surface energy of the quantum dot material is lowered. Then the quantum dot material is mixed with a colored photoresist material to obtain a color film mixed solution (50), and the color film mixed solution (50) is dried. Since the quantum dot material has low surface energy, in the process of drying a color film mixed material, the quantum dot material and the colored photoresist material can be automatically layered, such that a quantum dot layer (40) and a colored photoresist layer (30) can be formed simultaneously, and furthermore the manufacturing procedure and manufacturing cost of the color film substrate (100) are reduced.
Inventors:
SHI WEN (CN)
Application Number:
PCT/CN2018/074102
Publication Date:
February 28, 2019
Filing Date:
January 25, 2018
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
G02F1/1335
Foreign References:
| CN105404046A | 2016-03-16 | |||
| CN105319765A | 2016-02-10 | |||
| CN107329314A | 2017-11-07 | |||
| CN105388660A | 2016-03-09 | |||
| CN105116604A | 2015-12-02 | |||
| US20150369989A1 | 2015-12-24 |
Attorney, Agent or Firm:
SCIHEAD IP LAW FIRM (CN)
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