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Patent Searching and Data


Title:
COLOR FILTER SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND WOLED DISPLAY
Document Type and Number:
WIPO Patent Application WO/2019/214125
Kind Code:
A1
Abstract:
Provided are a color filter substrate and a manufacturing method therefor, and a WOLED display. The color filter substrate comprises an underlayer (10), a pixel definition layer (20) and a plurality of filter patterns (30), wherein a plurality of openings (21) are provided, corresponding to a plurality of sub-pixel regions (11), on the pixel definition layer (20); the plurality of filter patterns (30) are arranged in the plurality of openings (21) of the pixel definition layer (20) and on the underlayer (10); and each of the filter patterns (30) comprises a quantum dot layer (31) and a filter layer (33) which are sequentially arranged on the underlayer (10). Only one photoetching process is required to manufacture the openings (21) during the manufacturing of the color filter substrate, and the quantum dot layers (31) and the filter layers (33) of the filter patterns (30) can all be manufactured in the openings (21) by means of forming a solution into a film, so that the process is effectively simplified, and the production efficiency is improved. Moreover, when the color filter substrate is applied to the WOLED display, the light-emission efficiency and the color gamut of the WOLED display can be effectively improved, and the product quality is improved.

Inventors:
HUANG HUI (CN)
Application Number:
PCT/CN2018/105655
Publication Date:
November 14, 2019
Filing Date:
September 14, 2018
Export Citation:
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Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
H01L27/32; H01L51/56
Foreign References:
CN103235442A2013-08-07
CN105607344A2016-05-25
CN106784406A2017-05-31
CN103472513A2013-12-25
Attorney, Agent or Firm:
COMIPS INTELLECTUAL PROPERTY OFFICE (CN)
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