COLORED PHOTORESIST MATERIAL AND PREPARATION METHOD THEREFOR AND USE THEREOF

Title:

COLORED PHOTORESIST MATERIAL AND PREPARATION METHOD THEREFOR AND USE THEREOF

Document Type and Number:

WIPO Patent Application WO/2023/216939

Kind Code:

A1

Abstract:

The present invention provides a colored photoresist material and a preparation method therefor and a use thereof. On the basis of the total weight of the colored photoresist material, the colored photoresist material comprises 0.1-20 wt% of an organic dye. When the colored photoresist material of the present invention is used as a photoresist layer of a metal mesh touch sensor, the effects are achieved of shielding the metal color of the back surface so as to reduce the visibility of the metal mesh, and even reducing the color difference with the blackened layer, the surface whereof is blackened.

More Like This:

JP5557938	A pattern formation method using a positive resist constituent and the resist composition
JPH08292562	ANTIREFLECTION FILM COMPOSITION AND PRODUCTION OF PATTERN USING THE SAME
JP3991214	A novel sulfonyldiazomethane compound, a photoacid generator, and a resist material and pattern forming method using the same.

Inventors:

FENG XUPING (CN)
WANG JUN (CN)
HUANG XINYU (CN)
JIANG JONATHAN JIANGUO (CN)

Application Number:

PCT/CN2023/091743

Publication Date:

November 16, 2023

Filing Date:

April 28, 2023

Export Citation:

Click for automatic bibliography generation Help

Assignee:

FLEXTOUCH TECH CO LTD (CN)

International Classes:

G03F7/004

Foreign References:

CN114911131A	2022-08-16
EP1468332B1	2010-03-31
CN111303663A	2020-06-19
CN113215555A	2021-08-06
CN111052267A	2020-04-21
CN105573057A	2016-05-11

Attorney, Agent or Firm:

ACIP LAW OFFICES (CN)

Download PDF:

View/Download PDF PDF Help

Previous Patent: RANDOM PROBE, PREPARATION METHOD THEREFOR AND USE THEREOF

Next Patent: DOPED OXYGEN-SILICON MATERIAL, AND PREPARATION METHOD THEREFOR AND USE THEREOF