COMPOSITION FOR FORMING RESIST UNDERLAYER FILM TO REDUCE ENVIRONMENTAL IMPACT

Title:

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM TO REDUCE ENVIRONMENTAL IMPACT

Document Type and Number:

WIPO Patent Application WO/2023/238920

Kind Code:

A1

Abstract:

A composition for forming a resist underlayer film contains a first component, a second component, and a solvent. The second component is a water-soluble polymer, the mass ratio of the first component and the second component (first component: second component) is 99:1 to 50:50, and the solvent contains water in an amount of 50% by mass or more relative to the solvent.

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Inventors:

KAMIBAYASHI SATOSHI (JP)
KISHIOKA TAKAHIRO (JP)

Application Number:

PCT/JP2023/021446

Publication Date:

December 14, 2023

Filing Date:

June 09, 2023

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Assignee:

NISSAN CHEMICAL CORP (JP)

International Classes:

G03F7/11; C09D7/20; C09D7/63; C09D201/00; G03F7/20

Domestic Patent References:

WO2013022081A1	2013-02-14
WO2023037979A1	2023-03-16

Foreign References:

JP2007017950A	2007-01-25
JP2010091979A	2010-04-22

Attorney, Agent or Firm:

TAKAOKA Ryoichi et al. (JP)

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