Title:
COMPOSITION, POSITIVE ELECTRODE COMPOSITION, POSITIVE ELECTRODE SLURRY, POSITIVE ELECTRODE, AND SECONDARY BATTERY
Document Type and Number:
WIPO Patent Application WO/2022/034900
Kind Code:
A1
Abstract:
Provided are: a composition that serves as a binder that excels in suppressing decreases in battery performance at a high capacity electrode and in finding a balance between high temperature storage properties and DC resistance; and a positive electrode slurry, a positive electrode, and a secondary battery in which said composition is used. According to the present invention, a composition is provided that contains a graft copolymer, wherein: the graft copolymer has a backbone polymer and a branch polymer; the backbone polymer includes a polyvinyl alcohol structure; the branch polymer comprises a (meth)acrylonitrile monomer unit and/or a first monomer unit including a (meth)acrylic acid monomer; a gel fraction accounts for 30% or more of the composition; and the gel fraction is expressed by gel fraction% = A×100/1 when 1 g of the composition is added to 300 mL of dimethyl sulfoxide, the mixture is stirred for 15 hours at 60ºC and then filtered using No. 5C filter paper as defined by JIS P 3801, and the insoluble matter remaining on the filter paper as residue is considered to be Ag.
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Inventors:
KANTO RYOSUKE (JP)
ISHIGAKI YUHEI (JP)
WATANABE JUN (JP)
ISHIGAKI YUHEI (JP)
WATANABE JUN (JP)
Application Number:
PCT/JP2021/029650
Publication Date:
February 17, 2022
Filing Date:
August 11, 2021
Export Citation:
Assignee:
DENKA COMPANY LTD (JP)
International Classes:
C08F261/04; C08L29/04; C08L33/02; C08L33/20; C08L51/06; H01M4/13; H01M4/131; H01M4/139; H01M4/1391; H01M4/505; H01M4/525; H01M4/62; H01M4/64; H01M4/66
Domestic Patent References:
| WO2016024525A1 | 2016-02-18 | |||
| WO2017154949A1 | 2017-09-14 | |||
| WO2018230599A1 | 2018-12-20 | |||
| WO2020162503A1 | 2020-08-13 | |||
| WO2020162505A1 | 2020-08-13 | |||
| WO2020209260A1 | 2020-10-15 | |||
| WO2015053224A1 | 2015-04-16 | |||
| WO2018230599A1 | 2018-12-20 |
Foreign References:
| JP2000095823A | 2000-04-04 | |||
| JPH06506252A | 1994-07-14 | |||
| JP2010521798A | 2010-06-24 | |||
| JP2001256980A | 2001-09-21 | |||
| JP2013048043A | 2013-03-07 | |||
| JP2004227974A | 2004-08-12 | |||
| JP2013098123A | 2013-05-20 | |||
| JP2013084351A | 2013-05-09 | |||
| JPH06172452A | 1994-06-21 |
Other References:
See also references of EP 4198067A4
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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