Title:
COMPOSITION, SEMICONDUCTOR-ELEMENT MANUFACTURING METHOD, AND SEMICONDUCTOR-SUBSTRATE WASHING METHOD
Document Type and Number:
WIPO Patent Application WO/2023/182142
Kind Code:
A1
Abstract:
The present invention provides a composition with which the occurrence of defects in an application subject is suppressed even when said composition is used after a prescribed period of time has passed since manufacturing thereof. In addition, the present invention also provides a semiconductor-element manufacturing method and a semiconductor-substrate washing method. The composition according to the present invention contains an antibacterial agent, an organic acid, an organic amine, and water, wherein the water content thereof is 70 mass% or greater relative to the total mass of the aforementioned composition, and the pH thereof at 25°C is 4.0-9.0.
Inventors:
INABA TADASHI (JP)
MURO NAOTSUGU (JP)
KAMIMURA TETSUYA (JP)
OUCHI NAOKO (JP)
MURO NAOTSUGU (JP)
KAMIMURA TETSUYA (JP)
OUCHI NAOKO (JP)
Application Number:
PCT/JP2023/010327
Publication Date:
September 28, 2023
Filing Date:
March 16, 2023
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/304; C11D3/48; C11D7/26; C11D7/32; C11D7/36
Domestic Patent References:
| WO2021205797A1 | 2021-10-14 | |||
| WO2022024714A1 | 2022-02-03 | |||
| WO2013162020A1 | 2013-10-31 |
Foreign References:
| JP2020155568A | 2020-09-24 | |||
| JP2009531512A | 2009-09-03 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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