COMPOSITION

WIPO Patent Application WO/2017/115679

A1

The purpose of the present invention is to provide a composition for use in forming a coating film which can combine water repellency with resistance to heat and light and which, in the as-formed state, is free from turbidity or coating unevenness and needs no wiping step. The composition according to the present invention is characterized by comprising: an organosilicon compound (a) having at least one trialkylsilyl group and two or more silicon-containing hydrolyzable groups; and a metal compound (b) including a metal atom to which at least one hydrolyzable group has been bonded.

WO/1994/003529	HIGH CHAR YIELD SILAZANE DERIVED PRECERAMIC POLYMERS AND CURED COMPOSITIONS THEREOF
JP5105041	A composition for forming an insulating film and a method for producing the same, and a silica-based insulating film and a method for forming the same.
JP2009227888	COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM OBTAINED THEREBY

SAKURAI SAYAKA (JP)
HANAOKA HIDENORI (JP)

PCT/JP2016/087747

July 06, 2017

December 19, 2016

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SUMITOMO CHEMICAL CO (JP)

C08L83/14; C08G77/04; C08K5/5415; C08L83/04; C09D183/04; C09D183/14

WO2005030874A1

2005-04-07

JP2007063388A	2007-03-15
JP2011219664A	2011-11-04
JP2011208120A	2011-10-20
JP2004115572A	2004-04-15
JP2010037507A	2010-02-18
JP2013213181A	2013-10-17
JPH09157388A	1997-06-17
JP2014234506A	2014-12-15

See also references of EP 3398996A4

NAKAYAMA, Tohru et al. (JP)

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