Title:
POLYMER, RADIATION-SENSITIVE COMPOSITION, COMPOUND, AND METHOD FOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/115680
Kind Code:
A1
Abstract:
[Problem] The present invention addresses the problem of providing a radiation-sensitive composition having excellent LWR, CDU, and EL performance, and a compound and polymer used in the same. [Solution] A polymer having structural units (I) including a group represented by formula (1). (In formula (1): R1 and R2 are each independently any group selected from the group consisting of a straight-chain or branched C1-10 monovalent aliphatic hydrocarbon group which may be substituted, a C3-15 monovalent alicyclic hydrocarbon group which may be substituted, a group in which at least one methylene group of the aforementioned aliphatic hydrocarbon group or alicyclic hydrocarbon group is substituted with a divalent heteroatom-containing group, a C6-30 aromatic hydrocarbon group which may be substituted, and a C6-30 aromatic heterocyclic group which may be substituted; R1 and R2 are directly bonded to each other by a single bond, or may form a ring structure via any species selected from the group consisting of an oxygen atom, a sulfur atom, and a methylene group; R3 is a C3-15 monovalent bridged alicyclic hydrocarbon group including at least any species selected from the group consisting of a lactone skeleton, a sultone skeleton, and a lactam skeleton which may be substituted; X is a single bond or a divalent linking group; and * represents a bonding site with the polymer main chain.)
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Inventors:
NAITO MICHIYA (JP)
KAWAKAMI YUKI (JP)
HAYAKAWA MASAMICHI (JP)
UTSUMI YOSHIYUKI (JP)
KAWAKAMI YUKI (JP)
HAYAKAWA MASAMICHI (JP)
UTSUMI YOSHIYUKI (JP)
Application Number:
PCT/JP2016/087755
Publication Date:
July 06, 2017
Filing Date:
December 19, 2016
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
C08F20/18; G03F7/038; G03F7/039; G03F7/20
Foreign References:
| JP2013060419A | 2013-04-04 | |||
| JP2013001850A | 2013-01-07 | |||
| JP2014178479A | 2014-09-25 | |||
| JP2015135379A | 2015-07-27 | |||
| JP2010001461A | 2010-01-07 |
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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