Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM
Document Type and Number:
WIPO Patent Application WO/2020/040161
Kind Code:
A1
Abstract:
Provided is a composition containing a polyphenol compound (B), wherein the polyphenol compound (B) is one or more resins selected from the group consisting of resins having the structure represented by formula (1) and resins having the structure represented by formula (2).

Inventors:
SATO TAKASHI (JP)
ECHIGO MASATOSHI (JP)
MAKINOSHIMA TAKASHI (JP)
Application Number:
PCT/JP2019/032527
Publication Date:
February 27, 2020
Filing Date:
August 21, 2019
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C08L61/04; C07C39/367; C07C69/712; C07C69/96; C08G8/00; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
WO2016158168A12016-10-06
WO2016158169A12016-10-06
WO2016158170A12016-10-06
WO2016158456A12016-10-06
WO2016158457A12016-10-06
WO2016158458A12016-10-06
WO2017043561A12017-03-16
WO2017038643A12017-03-09
WO2017038645A12017-03-09
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Download PDF:
View/Download PDF      PDF Help



 
Previous Patent: MAGNETIC PRODUCT AND MAGNET HOOK

Next Patent: COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INS...