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Title:
COMPOUND, RESIN, BASE LAYER FILM-FORMING MATERIAL FOR LITHOGRAPHY, BASE LAYER FILM FOR LITHOGRAPHY, PATTERN-FORMING METHOD, AND METHOD FOR REFINING COMPOUND OR RESIN
Document Type and Number:
WIPO Patent Application WO/2015/137486
Kind Code:
A1
Abstract:
 This compound is represented by a specific formula. As a result of having the structure associated with the specific formula, this compound can be applied to wet processes, and has outstanding heat resistance and resistance to etching. In addition, as this compound has a specific structure, the compound has high heat resistance, a relatively high carbon concentration, a relatively low oxygen concentration, and high solubility in a solvent. As a consequence, by using this compound, deterioration in the film during high-temperature baking is minimized, and it is possible to form a base layer film with outstanding resistance to etching in the form of oxygen plasma etching and the like. The compound also has outstanding adhesion to the resist layer, making it possible to form an excellent resist pattern.

Inventors:
MAKINOSHIMA TAKASHI (JP)
ECHIGO MASATOSHI (JP)
Application Number:
PCT/JP2015/057471
Publication Date:
September 17, 2015
Filing Date:
March 13, 2015
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C39/15; C07C37/72; C08G8/20; G03F7/11
Domestic Patent References:
WO2013134997A12013-09-19
Foreign References:
US20140065533A12014-03-06
JP2007204574A2007-08-16
JPH10161332A1998-06-19
JPH0567701A1993-03-19
JPS5437492B11979-11-15
Other References:
SCHULTZ, ANDREAS ET AL.: "Tetraphenylethene- derived columnar liquid crystals and their oxidative photocyclization", EUROPEAN JOURNAL OF ORGANIC CHEMISTRY, vol. 15, 2003, pages 2829 - 2839, XP055224407
REDDY, D. SHEKHAR ET AL.: "Charge-transfer diamondoid lattices: an unprecedentedly huge and highly catenating diamondoid network arising from a tetraphenol as a tetrahedral node and benzoquinone as a linear spacer", ANGEWANDTE CHEMIE, vol. 39, no. 23, 2000, pages 4266 - 4268, XP055224414
VOGL, ERASMUS M. ET AL.: "Linking BINOL: C2- symmetric ligands for investigations on asymmetric catalysis", TETRAHEDRON LETTERS, vol. 39, no. 43, 1998, pages 7917 - 7920, XP055224419
See also references of EP 3118183A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
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