Title:
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2015/137485
Kind Code:
A1
Abstract:
This resist composition contains a compound that is represented by a specific formula. The compound has high heat resistance because of a skeleton thereof having high aromaticity and is able to be used under high-temperature baking conditions in spite of the low molecular weight thereof. Due to the above-described configuration, this resist composition is capable of providing a good resist pattern that has excellent heat resistance, high solubility in a safe solvent, and high sensitivity. Namely, this resist composition is useful as an acid-amplified non-polymer resist material.
Inventors:
SATO TAKASHI (JP)
ECHIGO MASATOSHI (JP)
ECHIGO MASATOSHI (JP)
Application Number:
PCT/JP2015/057470
Publication Date:
September 17, 2015
Filing Date:
March 13, 2015
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
G03F7/038; C07C39/15; G03F7/004; H01L21/027
Foreign References:
| JP2007241271A | 2007-09-20 | |||
| CN103304385A | 2013-09-18 | |||
| JP2006276742A | 2006-10-12 |
Other References:
DE SILVA, ANUJA; ET AL.: "Molecular glass resists for EUV lithography", PROCEEDINGS OF SPIE-THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING (PT. 2, ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, vol. 6153, 2006, pages 615341/1 - 615341/10, XP055224391
SUNDBERG, LINDA K.; ET AL.: "Visualization of the develop process", PROCEEDINGS OF SPIE (ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII, vol. 7972, 2011, pages 797201/1 - 797201/10, XP055224396
ARAI, TADASHI;: "Polyphenol-based positive-tone EB resist: Resist shade mask", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 17, no. 4, 2004, pages 567 - 573, XP055224404
SUNDBERG, LINDA K.; ET AL.: "Visualization of the develop process", PROCEEDINGS OF SPIE (ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVIII, vol. 7972, 2011, pages 797201/1 - 797201/10, XP055224396
ARAI, TADASHI;: "Polyphenol-based positive-tone EB resist: Resist shade mask", JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, vol. 17, no. 4, 2004, pages 567 - 573, XP055224404
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
Yoshiyuki Inaba (JP)
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