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Title:
COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING COMPOUND OR RESIN
Document Type and Number:
WIPO Patent Application WO/2016/143635
Kind Code:
A1
Abstract:
This compound is represented by formula (1). (In formula (1), R1's are each independently a divalent group having 1-30 carbon atoms, R2 to R7 are each independently a linear, branched, or cyclic alkyl group having 1-10 carbon atoms, an aryl group having 6-10 carbon atoms, an alkenyl group having 2-10 carbon atoms, a thiol group or a hydroxyl group, wherein at least one R5 is a hydroxyl group or a thiol group, m2, m3, and m6 are each independently an integer of 0-9, m4 and m7 are each independently an integer of 0-8, m5 is an integer of 1-9, n is an integer of 1-4, and p2 to p7 are each independently an integer of 0-2.)

Inventors:
HORIUCHI JUNYA (JP)
ECHIGO MASATOSHI (JP)
MAKINOSHIMA TAKASHI (JP)
Application Number:
PCT/JP2016/056449
Publication Date:
September 15, 2016
Filing Date:
March 02, 2016
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C39/15; C07C37/20; C07C37/72; C08G8/04; C08G8/20; G03F7/11
Domestic Patent References:
WO2011034062A12011-03-24
WO2015137486A12015-09-17
WO2015137485A12015-09-17
Foreign References:
JP2009114144A2009-05-28
JPH0519463A1993-01-29
Other References:
MANABE, KEI ET AL.: "Repetitive Synthetic Method for o,o,p-Oligophenylenes Using C-H Arylation", ORGANIC LETTERS, vol. 15, no. 2, 2013, pages 374 - 377, XP055309082, ISSN: 1523-7052
TSOLAKIS, P. K. ET AL.: "Synthesis of Rigid- Flexible Triblock Copolymers Using Atom Transfer Radical Polymerization", MACROMOLECULES, vol. 32, no. 26, 1999, pages 9054 - 9058, XP000899050, ISSN: 0024-9297
See also references of EP 3266759A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
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