Title:
COMPOUND, RESIN, AND METHOD FOR PURIFYING SAME, UNDERLAYER FILM FORMATION MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FORMING COMPOSITION, AND UNDERLAYER FILM, AND METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING CIRCUIT PATTERN
Document Type and Number:
WIPO Patent Application WO/2016/158457
Kind Code:
A1
Abstract:
The present invention provides a compound represented by formula (1). (In formula (1), R1 represents a C1-30 2n-valent group, and R2-R5 each independently represent a C1-10 straight chain, branched, or cyclic alkyl group, a C6-10 aryl group, a C2-10 alkenyl group, a C1-30 alkoxy group, a halogen atom, a thiol group, or a hydroxyl group. However, at least one selected from R1-R5 represents a group including an iodine atom, and at least one R4 and/or at least one R5 represents one or more species selected from the group consisting of a hydroxyl group and a thiol group. In the formula, m2 and m3 each independently represents an integer of 0-8, and m4 and m5 each independently represents an integer of 0-9. However, m4 and m5 do not both represent 0 at the same time. In the formula, n represents an integer of 1-4, and p2-p5 each independently represents an integer of 0-2.)
Inventors:
TOIDA TAKUMI (JP)
ECHIGO MASATOSHI (JP)
MAKINOSHIMA TAKASHI (JP)
ECHIGO MASATOSHI (JP)
MAKINOSHIMA TAKASHI (JP)
Application Number:
PCT/JP2016/058517
Publication Date:
October 06, 2016
Filing Date:
March 17, 2016
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C39/367; C07C37/72; C07C41/38; C07C43/23; C08G8/20; G03F7/11; H01L21/027
Domestic Patent References:
| WO2015137486A1 | 2015-09-17 |
Foreign References:
| JPH10161332A | 1998-06-19 | |||
| JP2002275112A | 2002-09-25 | |||
| JP2012077295A | 2012-04-19 |
Other References:
See also references of EP 3279179A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
Yoshiyuki Inaba (JP)
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