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Title:
RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2016/158458
Kind Code:
A1
Abstract:
A resist base material containing a compound having a specified structure, and/or a resin obtained using the compound as a monomer.

Inventors:
TOIDA TAKUMI (JP)
ECHIGO MASATOSHI (JP)
SATO TAKASHI (JP)
SHIMIZU YOUKO (JP)
Application Number:
PCT/JP2016/058519
Publication Date:
October 06, 2016
Filing Date:
March 17, 2016
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
G03F7/004; C08G83/00
Domestic Patent References:
WO2012153991A22012-11-15
WO2013024777A12013-02-21
WO2015137485A12015-09-17
WO2015137486A12015-09-17
Other References:
TORU AMAYA ET AL.: "Synthesis of three-dimensionally arranged bis-biphenol ligand on hexaaryl benzene scaffold and its application for cross-pinacol coupling reaction", TETRAHEDRON LETTERS, vol. 52, no. 35, 2 July 2011 (2011-07-02), pages 4567 - 4569, XP028248912
CHEONG-JIN JANG ET AL.: "Synthesis and Supramolecular Nanostructure of Amphiphilic Rigid Aromatic-Flexible Dendritic Block Melecules", CHEMISTRY OF MATERIALS, vol. 16, no. 22, 10 September 2004 (2004-09-10), pages 4226 - 4231, XP055319547
BEREKET GHEBREMARIAM ET AL.: "Synthesis of Asymmetric Septi-(p-Phenylene)s", TETRAHEDRON LETTERS, vol. 39, no. 30, 13 May 1998 (1998-05-13), pages 5335 - 5338, XP004123226
See also references of EP 3279728A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
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