Title:
COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN IN WHICH SAME IS USED
Document Type and Number:
WIPO Patent Application WO/2016/158168
Kind Code:
A1
Abstract:
This resist composition contains one or more components selected from among compounds represented by a specified formula, and resins obtained using the compounds as monomers.
Inventors:
TOIDA TAKUMI (JP)
ECHIGO MASATOSHI (JP)
SATO TAKASHI (JP)
SHIMIZU YOUKO (JP)
ECHIGO MASATOSHI (JP)
SATO TAKASHI (JP)
SHIMIZU YOUKO (JP)
Application Number:
PCT/JP2016/056332
Publication Date:
October 06, 2016
Filing Date:
March 02, 2016
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
G03F7/004; C07D311/78; G03F7/039; G03F7/20; G03F7/26
Domestic Patent References:
| WO2014123032A1 | 2014-08-14 | |||
| WO2005029189A1 | 2005-03-31 | |||
| WO2006068267A1 | 2006-06-29 | |||
| WO2008053974A1 | 2008-05-08 | |||
| WO2013024777A1 | 2013-02-21 | |||
| WO2008137816A2 | 2008-11-13 |
Foreign References:
| JPH1045764A | 1998-02-17 | |||
| JPH05163290A | 1993-06-29 |
Other References:
TIAN-JUN LIU ET AL.: "CHIRAL CONJUGATED OLIGOMER BASED ON 1,1'-BINOL WITH 3,3'- ACETYLENE-PHENYLENE-ACETYLENE SPACER", CHINESE JOURNAL OF POLYMER SCIENCE, vol. 19, no. 5, 2001, pages 521 - 526, XP055320371
See also references of EP 3279727A4
See also references of EP 3279727A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
Yoshiyuki Inaba (JP)
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