CONCENTRATION MONITORING SYSTEM, CONCENTRATION MANAGEMENT SYSTEM, AND CONCENTRATION MONITORING METHOD

WIPO Patent Application WO/2021/059754

A1

Provided is a concentration monitoring system which allows continuous concentration monitoring of a processing tank. The concentration monitoring system is provided with a first cycle in which a sample of a processing liquid to which a chemical has been added is taken from a processing tank in which the processing liquid is stored and supplied to a concentration meter which measures the concentration of the chemical, a second cycle in which a chemical solution having a known concentration of the chemical is supplied to the concentration meter, and a control device which controls the first cycle to evaluate the concentration of the chemical in the processing tank on the basis of the concentration of the sample measured by the concentration meter and controls the second cycle to evaluate the precision of the concentration meter on the basis of the concentration of the chemical solution measured by the concentration meter.

WO/2003/001136	COOLING PLATE AND METHOD OF PRODUCING THE SAME
JP2995172	[Title of Invention] Cylinder device
JPS5240445	PROCESS FOR FORMING ALUMINUM OXIDE THIN LAYER

CHIYOMARU MASARU (JP)
MIKAWA HIROAKI (JP)
OKUZAKI YUICHI (JP)

PCT/JP2020/029886

April 01, 2021

August 04, 2020

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MITSUBISHI HEAVY IND LTD (JP)

C25D11/04; C25D11/08; G01N29/024; G01N33/00

JPS6021443A	1985-02-02
JPH1090275A	1998-04-10
JPS6310233B2	1988-03-04
JP2001324489A	2001-11-22
JP2016029208A	2016-03-03
JPS604842A	1985-01-11
JP2007187446A	2007-07-26
JP2004534909A	2004-11-18
JPH08178913A	1996-07-12
JP5557750B2	2014-07-23
JP2876411B2	1999-03-31
JP2002047575A	2002-02-15
US6255123B1	2001-07-03

MATSUNUMA Yasushi et al. (JP)

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