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Patent Searching and Data


Title:
Cu-Ni-Si-BASED COPPER ALLOY SHEET MATERIAL, METHOD FOR PRODUCING SAME, AND CURRENT-CARRYING COMPONENT
Document Type and Number:
WIPO Patent Application WO/2021/140915
Kind Code:
A1
Abstract:
Provided is a copper alloy sheet material which exhibits etching properties that are advantageous for achieving high dimensional accuracy even when etching is carried out with an extremely narrow pitch, has a chemical composition that contains, in terms of mass%, 1.00-4.50% of Ni and 0.10-1.40% of Si and, if necessary, an appropriate amount of one or more of Co, Mg, Cr, P, B, Mn, Sn, Ti, Zr, Al, Fe, Zn and Ag, and in which in EBSD measurements of a cross section that is perpendicular to a rolling direction, if SS denotes the area of a region that satisfies at least one of the following conditions: the difference in crystal orientation from an S1 orientation (241)<112> is not more than 10° and the difference in crystal orientation from an S2 orientation (231)<124> is not more than 10°, and SB denotes the area of a region in which the difference in crystal orientation from a Brass orientation (011)<211>, the areal ratio SB/SS is 0.40 or more.

Inventors:
JIANG WANQING (JP)
HYODO HIROSHI (JP)
SUDA HISASHI (JP)
SUGAWARA AKIRA (JP)
Application Number:
PCT/JP2020/048167
Publication Date:
July 15, 2021
Filing Date:
December 23, 2020
Export Citation:
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Assignee:
DOWA METALTECH CO LTD (JP)
International Classes:
C22C9/06; C22C9/10; C22F1/08; C22F1/00
Foreign References:
JP2018178243A2018-11-15
JP2018035437A2018-03-08
JP2012126930A2012-07-05
JP2019077889A2019-05-23
Other References:
See also references of EP 4089189A4
Attorney, Agent or Firm:
KOMATSU Takashi (JP)
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