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Title:
CVD DEVICE AND CVD METHOD
Document Type and Number:
WIPO Patent Application WO/2012/090484
Kind Code:
A1
Abstract:
The purpose is to provide a plasma CVD device that is capable of improving accumulation speed of carbon film on a substrate for treatment, reducing the frequency of cleaning by reducing accumulation on members other than the substrate for treatment, and being produced inexpensively. The provided CVD device is characterized: by being provided with a vacuum container, a magnetic field formation means for forming a magnetic field within the vacuum container, a plasma generation means for generating plasma within the vacuum container, and a substrate holder for holding a substrate within the vacuum container; and in that the plasma generation means has an electrode provided within the substrate holder, and a power source for applying voltage to the electrode.

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Inventors:
XU GE (JP)
YAMANAKA KAZUTO (JP)
HIROISHI TSUTOMU (JP)
HIRAMATSU SHOGO (JP)
Application Number:
PCT/JP2011/007296
Publication Date:
July 05, 2012
Filing Date:
December 27, 2011
Export Citation:
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Assignee:
CANON ANELVA CORP (JP)
XU GE (JP)
YAMANAKA KAZUTO (JP)
HIROISHI TSUTOMU (JP)
HIRAMATSU SHOGO (JP)
International Classes:
C23C16/50; C01B31/02; C23C16/503
Foreign References:
JP2002363747A2002-12-18
JP2010209446A2010-09-24
JP2004339561A2004-12-02
JP2004273810A2004-09-30
JP2010166093A2010-07-29
JP2004186404A2004-07-02
JP2004256373A2004-09-16
JP2003318165A2003-11-07
Attorney, Agent or Firm:
OKABE, Yuzuru et al. (JP)
Okabe 讓 (JP)
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