CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN

WIPO Patent Application WO/2011/043029

A1

Disclosed are: a cyclic compound which has high solubility in a safe solvent and high sensitivity and is capable of providing a resist pattern having a good shape; a method for producing the cyclic compound; a radiation sensitive composition which contains the cyclic compound; and a method for forming a resist pattern using the radiation sensitive composition. Specifically disclosed are: a cyclic compound which has a specific structure; a radiation sensitive composition which contains the compound; and a method for forming a resist pattern using the composition.

JP4088250	Cosmetic flavors (fragrance) and food flavors (flavor) compositions
JPH08217713	PRODUCTION OF BISPHENOLS
WO/2008/154083	COMPOUNDS, COMPOSITIONS AND METHODS FOR THE TREATMENT OF SYNUCLEINOPATHIES

HAYASHI HIROMI (JP)
ECHIGO MASATOSHI (JP)
OGURO DAI (JP)

PCT/JP2010/005796

April 14, 2011

September 27, 2010

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MITSUBISHI GAS CHEMICAL CO (JP)
HAYASHI HIROMI (JP)
ECHIGO MASATOSHI (JP)
OGURO DAI (JP)

C07C39/17; C07C37/20; C08G8/04; G03F7/004; G03F7/038

WO2009075308A1

2009-06-18

JP2008116677A	2008-05-22
JP2004018421A	2004-01-22
JP2006016342A	2006-01-19
JP2003321423A	2003-11-11
JP2005326838A	2005-11-24
JP2008145539A	2008-06-26
JP2009173623A	2009-08-06
JPH06282067A	1994-10-07
JPH0764285A	1995-03-10
EP0632003A1	1995-01-04

T. NAKAYAMA; M. NOMURA; K. HAGA; M. UEDA, BULL. CHEM. SOC. JPN., vol. 71, 1998, pages 2979
See also references of EP 2487148A4

SUGIMURA, KENJI (JP)
Kenji Sugimura (JP)

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