CYCLIC FLUORINE COMPOUNDS, POLYMERIZABLE FLUOROMONOMERS, FLUOROPOLYMERS, AND RESIST MATERIALS CONTAINING THE FLUOROPOLYMERS AND METHOD FOR PATTERN FORMATION

Title:

CYCLIC FLUORINE COMPOUNDS, POLYMERIZABLE FLUOROMONOMERS, FLUOROPOLYMERS, AND RESIST MATERIALS CONTAINING THE FLUOROPOLYMERS AND METHOD FOR PATTERN FORMATION

Document Type and Number:

WIPO Patent Application WO/2005/005404

Kind Code:

A1

Abstract:

The invention provides cyclic fluorine compounds represented by the general formula (1): (1) (wherein R¹ is halogeno; and R² and R³ are each hydrogen or a hydrocarbon group which is a straight-chain, branched, or cyclic C_1-25 hydrocarbon group or an aromatic hydrocarbon group and may contain halogen, oxygen, nitrogen, or sulfur). The invention also discloses polymerizable fluoro- monomers derived from the above compounds; fluoropolymers obtained by polymerization or copolymerization of the above compounds or fluoromonomers; resist materials containing the fluoropolymers; and a method for pattern formation by using the fluoropolymers. The invention can provide polymers suitable for resist materials (particularly, vacuum-ultraviolet resist materials) which exhibit high transparency in a wide wavelength region of from ultraviolet region to near infrared region, high tight adhesion to substrates, excellent film-forming properties, high etching resistance, and high glass transition temperatures. Further, the method for pattern formation by using the fluoropolymers is suitable for the formation of high-resolution patterns.

More Like This:

WO/2013/080217	CRYSTALLINE FORMS OF CARBAZITAXEL AND PROCESS FOR PREPARATION THEREOF
JPH11501931	[Title of Invention] Cephalomannine epoxides, analogs thereof, and methods for producing them.
JP2000514458	[Title of the Invention] A method for selective acylation of 10-deacetylbacatin III at the C-10 position.

Inventors:

SUMIDA SHINICHI (JP)
KOMORIYA HARUHIKO (JP)
MAEDA KAZUHIKO (JP)

Application Number:

PCT/JP2004/009680

Publication Date:

January 20, 2005

Filing Date:

July 01, 2004

Export Citation:

Click for automatic bibliography generation Help

Assignee:

CENTRAL GLASS CO LTD (JP)
SUMIDA SHINICHI (JP)
KOMORIYA HARUHIKO (JP)
MAEDA KAZUHIKO (JP)

International Classes:

C07D305/14; C08F12/22; C08F12/32; C08F16/26; C08F20/10; C08F20/30; C08F32/02; G03F7/004; G03F7/039; G03F7/075; H01L21/027; (IPC1-7): C07D305/14; C08F12/14; C08F16/24; C08F20/28; C08F32/08; C08G77/14; G03F7/033; G03F7/039

Domestic Patent References:

WO2001098834A1

2001-12-27

Foreign References:

JP2002275215A	2002-09-25
JP2002338633A	2002-11-27
JP2002327013A	2002-11-15
JP2002351079A	2002-12-04
JP2002145962A	2002-05-22
JP2002206012A	2002-07-26

Attorney, Agent or Firm:

Miyakoshi, Noriaki (12th Floor ARK Mori Building, 12-32, Akasaka 1-chom, Minato-ku Tokyo, JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: PROCESS FOR PREPARATION OF OXETAN-2-ONES

Next Patent: METHOD FOR OBTAINING OLIGOMERS OF POLYTETRAHYDROFURANE OR TETRAHYDROFURANE COPOLYMERS