DEFECT INSPECTION METHOD, AND APPARATUS USING SAME

WIPO Patent Application WO/2014/034271

A1

The purpose is to enable detection of a defect, such as microscopic foreign matter, with high detection sensitivity by decreasing the side lobe of a pattern image with strong scattering light intensity which is an obstructive factor in improving defect detection sensitivity in a dark-field examination system. In a defect inspection method for detecting a defect on a sample surface, when the sample surface is imaged, of the light condensed by an objective lens on a Fourier transform plane of the objective lens, diffracted light from a pattern formed on the sample is blocked with a spatial filter. The blocking includes blocking the diffracted light in an area on the Fourier transform plane in which the diffracted light from the pattern formed on the sample is strongly distributed with a light blocking pattern, and decreasing the optical intensity of an image formed via an imaging lens by the diffracted light that has passed the sides of the light blocking pattern with a reduction pattern.

SHIBATA YUKIHIRO (JP)
URANO YUTA (JP)
HONDA TOSHIFUMI (JP)

PCT/JP2013/068513

March 06, 2014

July 05, 2013

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HITACHI HIGH TECH CORP (JP)

G01N21/956; H01L21/66

JP2008543114A	2008-11-27
JP2011523711A	2011-08-18
JPH0943160A	1997-02-14
JP2004053258A	2004-02-19
JP2011149869A	2011-08-04
JP2008145399A	2008-06-26
JP2008116405A	2008-05-22
JP2012137350A	2012-07-19

POLAIRE I. P. C. (JP)
Polaire Intellectual Property Corporation (JP)

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