DEFECT INSPECTION SYSTEM FOR INSPECTING OBJECT HAVING IRREGULAR PATTERNS

Title:

DEFECT INSPECTION SYSTEM FOR INSPECTING OBJECT HAVING IRREGULAR PATTERNS

Document Type and Number:

WIPO Patent Application WO/2014/192999

Kind Code:

A1

Abstract:

Disclosed is a system for inspecting an object having irregular patterns, for example, for inspecting a waviness defect in a transparent film. The defect inspection system for inspecting a waviness defect in an object having a non-uniform thickness comprises a light source for outputting planar light and a light conversion unit for converting the planar light outputted from the light source into point light, wherein the light outputted from the light source is incident on the object through the light conversion unit.

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Inventors:

LEE SOON-JONG (KR)
WOO BONG-JOO (KR)
CHOI SEONG-JIN (KR)
WON JUN-YEON (KR)

Application Number:

PCT/KR2013/004723

Publication Date:

December 04, 2014

Filing Date:

May 29, 2013

Export Citation:

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Assignee:

SEMISYSCO CO LTD (KR)

International Classes:

G01N21/958

Foreign References:

JP2006292668A	2006-10-26
KR20090054252A	2009-05-29
US4965451A	1990-10-23
JP2012122794A	2012-06-28
EP1126273A1	2001-08-22

Attorney, Agent or Firm:

SONG, IN-HO (KR)
송인호 (KR)

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