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Title:
DEFECT OBSERVATION DEVICE AND DEFECT OBSERVATION METHOD
Document Type and Number:
WIPO Patent Application WO/2016/092640
Kind Code:
A1
Abstract:
In a scheme for analyzing low magnification defect images and determining whether or not a defect detection method using cell comparison is applicable, if a defect detection method using cell comparison cannot be applied and the proportion transitioning to a defect detection method using die comparison increases, throughput may decrease even more than starting out with defect detection by a defect detection method using die comparison. The purpose of present invention is to carry out high precision defect detection with a stable throughput. In the present invention, the defect detection processing mode applied for detecting defects from the defect image is determined using a reference image, and defects are detected from the defect image by the defect detection processing mode that has been determined.

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Inventors:
HIRAI TAKEHIRO (JP)
NAKAYAMA HIDEKI (JP)
NISHIGATA KENICHI (JP)
Application Number:
PCT/JP2014/082609
Publication Date:
June 16, 2016
Filing Date:
December 10, 2014
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01L21/66; G01N21/956
Foreign References:
JP2009283917A2009-12-03
JP2010161247A2010-07-22
JP2014181966A2014-09-29
JP2005274172A2005-10-06
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
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