Title:
DEFECT OBSERVATION SYSTEM AND DEFECT OBSERVATION METHOD
Document Type and Number:
WIPO Patent Application WO/2014/034252
Kind Code:
A1
Abstract:
When contamination or local electrification has arisen during low-magnification image acquisition, if the portion at which contamination or local electrification has arisen in a high-magnification image and a portion at which contamination or local electrification has not arisen become mixed, the region at which the image quality has changed as a result of the contamination or local electrification is misidentified as a defect, and so defect detection fails or a defect feature quantity can no longer be correctly determined. Thus, the present invention is a defect observation system that acquires a sample image at a low magnification rate and a high magnification rate and that is characterized by setting the position or size of field of view of the high-magnification image or the electron beam irradiation range during low-magnification-rate image capture in a manner so that the outer margin of the image acquired at the low magnification rate is not contained in the image acquired at the high magnification rate.
Inventors:
HIRAI TAKEHIRO (JP)
SAKAMOTO MASASHI (JP)
NAKAYAMA HIDEKI (JP)
SAKAMOTO MASASHI (JP)
NAKAYAMA HIDEKI (JP)
Application Number:
PCT/JP2013/067969
Publication Date:
March 06, 2014
Filing Date:
July 01, 2013
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/28; H01J37/22; H01L21/66
Foreign References:
| JP2011158256A | 2011-08-18 | |||
| JP2006145269A | 2006-06-08 | |||
| JPH05151927A | 1993-06-18 | |||
| JPH01209647A | 1989-08-23 |
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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