Title:
DEFOAMING AGENT
Document Type and Number:
WIPO Patent Application WO/2011/043299
Kind Code:
A2
Abstract:
Disclosed is a defoaming agent which exhibits excellent defoaming properties (initial defoaming and foam control). The defoaming agent is characterised by: containing a bisamide (A) dispersed in a polyether compound (B); the bisamide (A) content being 0.01-10 % by weight and the polyether compound (B) content being 90-99.99 % by weight when expressed in terms of the overall weight of the bisamide (A) and the polyether compound (B); and the mode of the volume-based particle diameter distribution of the bisamide (A) being 0.1-5 μm. The bisamide (A) is preferably a bisamide represented by general formula (1), where R1 is an alkyl, alkenyl, hydroxyalkyl or hydroxyalkenyl group and has a carbon number of 10-22, and t is an integer from 1-6: R1CONH(CH2)t-NHCOR1.
More Like This:
JP2000198997 | FINELY PARTICULATE FOAM CONTROL AGENT |
WO/2018/180211 | METHOD FOR PRODUCING ZEOLITE MEMBRANE STRUCTURE |
JPH07204409 | PARTICULATE FOAM CONTROL AGENT |
Inventors:
MATSUMURA YOHEI (JP)
IZUMI YOSHIHIDE (JP)
HISADA NOBUO (JP)
IZUMI YOSHIHIDE (JP)
HISADA NOBUO (JP)
Application Number:
PCT/JP2010/067374
Publication Date:
April 14, 2011
Filing Date:
October 04, 2010
Export Citation:
Assignee:
SAN NOPCO KK (JP)
MATSUMURA YOHEI (JP)
IZUMI YOSHIHIDE (JP)
HISADA NOBUO (JP)
MATSUMURA YOHEI (JP)
IZUMI YOSHIHIDE (JP)
HISADA NOBUO (JP)
International Classes:
B01D19/04; C09D7/63
Foreign References:
JPH0199619A | 1989-04-18 | |||
JPH04132705A | 1992-05-07 | |||
JP2009007506A | 2009-01-15 | |||
JPH0762212A | 1995-03-07 | |||
JPS6358610B2 | 1988-11-16 | |||
JPH0859770A | 1996-03-05 | |||
JP2000344881A | 2000-12-12 |
Other References:
"Paint Raw Material Manual", JAPAN PAINT MANUFACTURERS ASSOCIATION, pages: 333 - 447
See also references of EP 2486967A4
See also references of EP 2486967A4
Attorney, Agent or Firm:
SAKURAI, KEN-ICHI (JP)
Ken-ichi Sakurai (JP)
Ken-ichi Sakurai (JP)
Download PDF:
Previous Patent: BASE STATION APPARATUS AND INTERFERENCE SUPPRESSING METHOD
Next Patent: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
Next Patent: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME