Title:
DEPTH MEASUREMENT DEVICE, DEPTH MEASUREMENT SYSTEM, AND DEPTH INDEX VALUE CALCULATION METHOD
Document Type and Number:
WIPO Patent Application WO/2022/249489
Kind Code:
A1
Abstract:
Provided is a depth measurement system comprising a plurality of depth measurement devices which each calculate a depth index value indicating the relative depth of a pattern on a sample, wherein: the plurality of depth measurement devices are classified into one reference device 1001 and an other correction target device 1002; the depth measurement devices each execute a depth measurement recipe for measuring the depth of a predetermined pattern in a measurement subject so as to calculate the depth index value of the predetermined pattern on the basis of a measurement value extracted from an obtained electronic image; and the correction target device stores a correction coefficient associated with the depth measurement recipe and outputs the depth index value of the predetermined pattern which has been corrected using a mathematical model to which the correction coefficient is applied.
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Inventors:
YAMAUCHI AOI (JP)
DOI AYUMI (JP)
SUZUKI MAKOTO (JP)
TAKAHASHI SHUUICHIROU (JP)
SUGIE MASAKI (JP)
DOI AYUMI (JP)
SUZUKI MAKOTO (JP)
TAKAHASHI SHUUICHIROU (JP)
SUGIE MASAKI (JP)
Application Number:
PCT/JP2021/020550
Publication Date:
December 01, 2022
Filing Date:
May 28, 2021
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G01B15/04
Domestic Patent References:
| WO2020095346A1 | 2020-05-14 |
Foreign References:
| JP2006153837A | 2006-06-15 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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