Title:
DETERMINATION OF CENTER OF FOCUS BY CROSS-SECTION ANALYSIS
Document Type and Number:
WIPO Patent Application WO2003032085
Kind Code:
A3
Abstract:
Methods for determination of parameters in lithographic devices and applications by cross-section analysis of scatterometry models, including determination of center of focus in lithography devices and applications. Control methods are provided for process control of center of focus in lithography devices utilizing cross-section analysis.
Inventors:
LITTAU MICHAEL E (US)
RAYMOND CHRISTOPHER J (US)
RAYMOND CHRISTOPHER J (US)
Application Number:
PCT/US2002/032394
Publication Date:
December 11, 2003
Filing Date:
October 10, 2002
Export Citation:
Assignee:
ACCENT OPTICAL TECH INC (US)
LITTAU MICHAEL E (US)
RAYMOND CHRISTOPHER J (US)
LITTAU MICHAEL E (US)
RAYMOND CHRISTOPHER J (US)
International Classes:
G03F7/20; G03F7/207; H01L21/027; (IPC1-7): G01N21/86; G01B27/48
Foreign References:
| US6088113A | 2000-07-11 | |||
| US5953128A | 1999-09-14 | |||
| US5952132A | 1999-09-14 | |||
| US5712707A | 1998-01-27 |
Other References:
See also references of EP 1436670A4
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