Title:
DEUTERIUM RECOVERY METHOD AND DEUTERIUM RECOVERY EQUIPMENT
Document Type and Number:
WIPO Patent Application WO/2023/026721
Kind Code:
A1
Abstract:
The objective of the present invention is to provide a deuterium recovery method and deuterium recovery equipment capable of recovering and reusing deuterium or a compound thereof used in a semiconductor manufacturing process. The present invention provides a deuterium recovery method comprising a heavy water generation step for generating heavy water in exhaust gas that contains deuterium gas in the semiconductor manufacturing process.
Inventors:
KOMURA NAOKI (JP)
FUJII ATSUHIRO (JP)
FUJII ATSUHIRO (JP)
Application Number:
PCT/JP2022/027711
Publication Date:
March 02, 2023
Filing Date:
July 14, 2022
Export Citation:
Assignee:
TAIYO NIPPON SANSO CORP (JP)
International Classes:
C01B5/02; C01B4/00; C01C1/00; C01C1/02; C25B1/04; C25B1/27; C25B9/00
Foreign References:
| JP2011146642A | 2011-07-28 | |||
| JP2013170982A | 2013-09-02 | |||
| CN111921345A | 2020-11-13 |
Attorney, Agent or Firm:
SHIGA INTERNATIONAL PATENT OFFICE (JP)
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