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Patent Searching and Data


Title:
DEVICE ABNORMALITY MONITORING METHOD AND SYSTEM
Document Type and Number:
WIPO Patent Application WO/2010/082322
Kind Code:
A1
Abstract:
A technique relating to a device abnormality monitoring method and realizing, for example, a model capable of precisely detecting abnormality and monitoring using the model. In the device abnormality monitoring system, a model making module (2) makes, by regression analysis, a group model including prediction models of objective variables (Y) by using a plurality of state data items (DS) measured by a target device (1) for respective explanatory variables (X). Using this group model, a monitoring module (3) monitors the state of the device (1) to detect an abnormality, if any. In particular, the explanatory variables (X) are divided into collinearity items (XA) and independence items (XB). For each collinearity item (XA), an individual model using the collinearity items (XA) and the independence items (XB) is made. Using the group model, the prediction value of an objective variable (Y), the degree of deviation between the prediction value and the measured value, the group deviation degree, etc. are calculated.

Inventors:
TAMAKI KENJI (JP)
MIWA TOSHIHARU (JP)
Application Number:
PCT/JP2009/050385
Publication Date:
July 22, 2010
Filing Date:
January 14, 2009
Export Citation:
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Assignee:
HITACHI LTD (JP)
TAMAKI KENJI (JP)
MIWA TOSHIHARU (JP)
International Classes:
G05B23/02
Foreign References:
JP2008204282A2008-09-04
JP2007026134A2007-02-01
JP2008072047A2008-03-27
JPH06187030A1994-07-08
Attorney, Agent or Firm:
TSUTSUI, YAMATO (JP)
Tsutsui Daiwa (JP)
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