Title:
DIGITAL EXPOSURE SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/177039
Kind Code:
A1
Abstract:
A digital exposure system, according to one embodiment of the present invention, comprises: a light source that radiates light to a substrate; a digital mirror device that selectively transmits the light emitted from the light source so as to form a two-dimensional pattern image; an optical system that modulates the two-dimensional pattern image into a one-dimensional pattern image; and a substrate scanner that continuously scans and exposes the one-dimensional pattern image to a photoresist film on the substrate by adjusting the position of the substrate, wherein the two-dimensional pattern image has a uniform image in a direction parallel to a scanning direction of the substrate, and an image of a target pattern in a direction perpendicular to the scanning direction of the substrate.
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Inventors:
JANG WON SEOK (KR)
LEE WON-SUP (KR)
CHO HYUNMIN (KR)
KIM GEE HONG (KR)
LIM HYUNG JUN (KR)
LEE WON-SUP (KR)
CHO HYUNMIN (KR)
KIM GEE HONG (KR)
LIM HYUNG JUN (KR)
Application Number:
PCT/KR2022/018248
Publication Date:
September 21, 2023
Filing Date:
November 17, 2022
Export Citation:
Assignee:
KOREA INST MACH & MATERIALS (KR)
International Classes:
G03F7/20
Foreign References:
| JP2004056100A | 2004-02-19 | |||
| KR20070078241A | 2007-07-31 | |||
| KR20190142766A | 2019-12-27 | |||
| US20110253425A1 | 2011-10-20 | |||
| US20170131176A1 | 2017-05-11 | |||
| KR20160111524A | 2016-09-26 |
Attorney, Agent or Firm:
PANKOREA PATENT AND LAW FIRM (KR)
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