Title:
DIRECT IMAGING EXPOSURE DEVICE AND DIRECT IMAGING EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2018/088550
Kind Code:
A1
Abstract:
[Problem] To enable resolution to be effectively increased beyond a conventional resolution limit such that the pattern of applied light approaches a designed exposure pattern as much as possible. [Solution] Light in an exposure pattern is applied to an exposure area E by an exposure unit provided with a spatial light modulator that is a DMD, and while an object W is being moved through the exposure area E by a moving mechanism, a photosensitive layer at the surface of the object W is exposed by applying light having a critical exposure amount or more thereto. A point to be exposed of the object W is located at corresponding coordinates G corresponding to a pixel mirror in an on state of the spatial light modulator at multiple times and multiply exposed. The number of times of multiple exposure at an exposure point the distance of which to the boundary of a designed exposure pattern is less than an exposure point pitch is smaller than a maximum number of times set according to the distance to the boundary.
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Inventors:
SUZUKI SHOJI (JP)
Application Number:
PCT/JP2017/040719
Publication Date:
May 17, 2018
Filing Date:
November 13, 2017
Export Citation:
Assignee:
ADTEC ENG CO LTD (JP)
International Classes:
G03F7/20
Domestic Patent References:
| WO2005022263A2 | 2005-03-10 | |||
| WO1994028574A1 | 1994-12-08 | |||
| WO2008122419A1 | 2008-10-16 |
Foreign References:
| JP2010156901A | 2010-07-15 | |||
| JP2005123234A | 2005-05-12 | |||
| JP2011066087A | 2011-03-31 |
Attorney, Agent or Firm:
HOTATE Koichi (JP)
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