DISPLAY DEVICE AND MANUFACTURING METHOD THEREFOR

WIPO Patent Application WO/2018/108069

A1

Disclosed is a method for manufacturing a display device, the method comprising: providing a substrate (100); forming a polysilicon layer on the substrate (100); patterning the polysilicon layer, so as to form a plurality of polysilicon blocks (110); implanting ions into the plurality of polysilicon blocks (110); forming a gate insulation layer on the plurality of polysilicon blocks (110); forming a first conductive layer on the gate insulation layer; and patterning the first conductive layer to form a plurality of data lines (120), wherein the positions of some line segments of the plurality of data lines (120) overlap with those of the plurality of polysilicon blocks (110), so as to form a plurality of compensation capacitors. An overlapping region of a polysilicon layer doped with impurities and a first conductive layer is used to form a compensation capacitor, so as to reduce the occupation area of the compensation capacitor, thereby preventing the problem that a scanning line cannot be connected to a GIP circuit.

JP4000087	Semiconductor devices and their manufacturing methods
WO/2014/192873	COMPOSITE SUBSTRATE AND METHOD FOR MANUFACTURING SAME
JP6930229	Manufacturing method of semiconductor devices

SONG YANQIN (CN)
HU SIMING (CN)
YANG NAN (CN)
ZHANG JIUZHAN (CN)

PCT/CN2017/115604

June 21, 2018

December 12, 2017

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KUNSHAN NEW FLAT PANEL DISPLAY TECH CENTER (CN)
KUNSHAN GOVISIONOX OPTOELECTRONICS CO LTD (CN)

H01L27/12; H01L21/77

CN103296030A	2013-09-11
CN1628263A	2005-06-15
CN101286515A	2008-10-15
CN101779227A	2010-07-14
CN103325688A	2013-09-25
CN105204248A	2015-12-30
US20060092342A1	2006-05-04

See also references of EP 3528286A4

SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)

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