Title:
DRESSER FOR POLISHING PAD, DRESSING METHOD, POLISHING METHOD, AND METHOD FOR MANUFACTURING WORKPIECE
Document Type and Number:
WIPO Patent Application WO/2023/132165
Kind Code:
A1
Abstract:
Provided is a novel dresser capable of imparting high flatness to a polishing pad. A dresser for a surface of a polishing pad is provided, comprising a circular dressing surface having a diameter DCD and facing the pad surface, and pellets arranged on the dressing surface. The pellets are arranged concentrically on the dressing surface in a circumferential region having a diameter PCDn. An area ratio of the pellets arranged in the circumferential region is any one of predetermined first, second, and third types.
Inventors:
KISHIMOTO MASATOSHI (JP)
SUZUKI TAKEHIRO (JP)
SUZUKI TAKEHIRO (JP)
Application Number:
PCT/JP2022/044300
Publication Date:
July 13, 2023
Filing Date:
November 30, 2022
Export Citation:
Assignee:
NORITAKE CO LTD (JP)
International Classes:
B24B53/017; B24B53/12; H01L21/304
Foreign References:
| JP2002346927A | 2002-12-04 | |||
| JP2003175468A | 2003-06-24 | |||
| JP2007152511A | 2007-06-21 | |||
| JP2020157421A | 2020-10-01 | |||
| JP2020104234A | 2020-07-09 |
Attorney, Agent or Firm:
KONISHI, Tomimasa (JP)
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